Title:
RESIST UNDERLAYER FILM-FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/052127
Kind Code:
A1
Abstract:
[Problem] To provide a novel resist underlayer film-forming composition. [Solution] A lithographic resist underlayer film-forming composition containing a copolymer having the structural units given by formulas (1) to (3), a crosslinking agent, an organic acid catalyst, and a solvent. [Chemical Formula 1] (In the formulas, R1 each independently represents a hydrogen atom or a methyl group; R2 represents an alkylene group having 1 to 3 carbon atoms; A represents a protective group; R3 represents an organic group having a 4-membered cyclic to 7-membered cyclic lactone skeleton, an adamantane skeleton, a tricyclodecane skeleton, or a norbornane skeleton; and R4 represents a linear, branched chain, or cyclic organic group having 1 to 12 carbon atoms wherein at least 1 hydrogen atom is substituted by a fluoro group and that optionally has at least 1 hydroxy group as a substituent.)
Inventors:
NISHITA TOKIO (JP)
SAKAMOTO RIKIMARU (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2017/033521
Publication Date:
March 22, 2018
Filing Date:
September 15, 2017
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/11; C08F220/18; C08F220/24; C08F220/36; G03F7/20
Domestic Patent References:
| WO2015178235A1 | 2015-11-26 | |||
| WO2017086213A1 | 2017-05-26 | |||
| WO2011065207A1 | 2011-06-03 |
Foreign References:
| JP2011102974A | 2011-05-26 | |||
| JP2015087749A | 2015-05-07 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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