Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
RESISTANCE MEASUREMENT DEVICE, FILM MANUFACTURING DEVICE, AND CONDUCTIVE FILM MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/187393
Kind Code:
A1
Abstract:
This resistance measurement device is for measuring the sheet resistance of a conductive film that is elongated in one direction. The resistance measurement device comprises: two probes that are disposed so as to oppose each other with a space interposed therebetween such that the probes do not come into contact with the conductive film and the conductive film can be interposed between the probes; a scanning unit for scanning the two probes in an intersecting direction intersecting the one direction; and a calculation unit for calculating the sheet resistance of the conductive film on the basis of voltages measured by the two probes. The calculation unit has a memory for storing a reference voltage measured by scanning the two probes in the intersecting direction without the conductive film interposed therebetween. An actual voltage measured by scanning the two probes in the intersecting direction with the conductive film interposed therebetween is corrected on the basis of the reference voltage.

Inventors:
MORIMITSU DAIKI (JP)
Application Number:
PCT/JP2018/046375
Publication Date:
October 03, 2019
Filing Date:
December 17, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NITTO DENKO CORP (JP)
International Classes:
G01R27/02; C23C14/34; C23C14/54; C23C14/56; G01R35/00
Foreign References:
JP2012073132A2012-04-12
JPS60249067A1985-12-09
JP2000314754A2000-11-14
Attorney, Agent or Firm:
OKAMOTO, Hiroyuki et al. (JP)
Download PDF: