Title:
RETAINER RING, METHOD FOR MANUFACTURING SAME, AND CMP APPARATUS COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2022/139185
Kind Code:
A1
Abstract:
A retainer ring according to an embodiment of the present invention, which is a retainer ring used in a CMP apparatus, comprises: a frame layer which is coupled to the bottom of a carrier of the CMP apparatus and includes a thermosetting resin or a thermoplastic resin; and a synthetic resin layer which is disposed on the bottom of the frame layer and of which the lower portion contacts a polishing pad to retain a wafer, wherein the synthetic resin layer has a plurality of recesses formed on one side in the direction of the frame layer.
Inventors:
CHOI HYUN SEOK (KR)
HAN SANG HYO (KR)
HAN BYUNG HEE (KR)
HAN SANG HYO (KR)
HAN BYUNG HEE (KR)
Application Number:
PCT/KR2021/016908
Publication Date:
June 30, 2022
Filing Date:
November 17, 2021
Export Citation:
Assignee:
SMT CORP (KR)
International Classes:
B24B37/32; B29C45/14; B29C45/40; B29D12/00; H01L21/67; B29K101/10
Foreign References:
| KR20200007529A | 2020-01-22 | |||
| KR101224539B1 | 2013-01-21 | |||
| JP2014110428A | 2014-06-12 | |||
| KR100801371B1 | 2008-02-05 | |||
| US20150367478A1 | 2015-12-24 |
Attorney, Agent or Firm:
KANGIN IP & LAW (KR)
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