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Title:
REVERSE OSMOSIS TREATMENT DEVICE AND REVERSE OSMOSIS TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2020/085106
Kind Code:
A1
Abstract:
The present invention provides reverse osmosis treatment device and a reverse osmosis treatment method such that feed water having a high level of TDS can be stably treated by reverse osmosis while fouling of the reverse osmosis membrane is suppressed so that the reverse osmosis membrane does not significantly deteriorate. This reverse osmosis treatment device (1) produces purified water by having a configuration comprising a first reverse osmosis membrane unit (10) for carrying out reverse osmosis treatment on first feed water to separate the same into first permeate water and first concentrated water, a mixing unit (15) for mixing second feed water having a greater content of total dissolved solids than the first feed water with the first concentrated water to obtain mixed water, and a second reverse osmosis membrane unit (20) for carrying out reverse osmosis treatment on the mixed water to separate the same into second permeate water and second concentrated water, wherein first concentrated water piping (130) or mixed water piping (210) has a chemical injection part (II, III) for injecting chloramine or a chloramine precursor into the piping, while the chloramine or the chloramine precursor is not injected into second feed water piping (150), which sends the second feed water to the mixing unit (15).

Inventors:
FUKUZAKI KOJI (JP)
MIYAKAWA HIROKI (JP)
TERUI SHIGEKI (JP)
KONDO YASUTAKA (JP)
Application Number:
PCT/JP2019/040041
Publication Date:
April 30, 2020
Filing Date:
October 10, 2019
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
B01D65/08; B01D61/08; B01D61/10; B01D61/12; B01D61/58; B01D65/02; C02F1/44; C02F1/50; C02F1/70; C02F1/76
Domestic Patent References:
WO2011021415A12011-02-24
WO2013058063A12013-04-25
Foreign References:
JP2015182073A2015-10-22
JP2011104504A2011-06-02
JP2014221450A2014-11-27
Attorney, Agent or Firm:
ISONO INTERNATIONAL PATENT OFFICE, P.C. (JP)
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