RINSING FLUID FOR LITHOGRAPHY - TOKYO OHKA KOGYO CO LTD

Title:

RINSING FLUID FOR LITHOGRAPHY

Document Type and Number:

WIPO Patent Application WO/2005/103831

Kind Code:

A1

Abstract:

The invention provides a novel rinsing fluid which can convert an easily wettable resist pattern surface having a contact angel of 40° or below into one having a contact angle of 70° or above to inhibit pattern collapse effectively and thereby give high-quality products. The rinsing fluid consists of a solution containing at least one fluorine compound soluble in water or alcoholic solvents which is selected from among compounds represented by the general formula (&Verbar ), those represented by the general formula (&Verbar &Verbar ), and those represented by the general formula: R_f^'-COOH: wherein R¹ and R² are each optionally substituted C_1-5 alkyl whose hydrogen atoms are partially or wholly replaced by fluorine, or R¹ and R² together with the SO₂groups to which they are bonded and the nitrogen atom may form a five- or six-membered ring; R_f is optionally substituted C_1-5 alkyl whose hydrogen atoms are partially or wholly replaced by fluorine; m and n are each an integer of 2 or 3; and R_f^' is at least partially fluorinated alkyl having 8 to 20 carbon atoms.

Inventors:

KOSHIYAMA JUN (JP)
WAKIYA KAZUMASA (JP)
KANEKO FUMITAKE (JP)
MIYAMOTO ATSUSHI (JP)
TAJIMA HIDEKAZU (JP)
SAWADA YOSHIHIRO (JP)

Application Number:

PCT/JP2005/007504

Publication Date:

November 03, 2005

Filing Date:

April 20, 2005

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)
KOSHIYAMA JUN (JP)
WAKIYA KAZUMASA (JP)
KANEKO FUMITAKE (JP)
MIYAMOTO ATSUSHI (JP)
TAJIMA HIDEKAZU (JP)
SAWADA YOSHIHIRO (JP)

International Classes:

G03F7/32; C11D3/24; C11D3/34; C11D11/00; H01L21/027; (IPC1-7): G03F7/32; H01L21/027

Foreign References:

JP2002323773A	2002-11-08
JPH07142349A	1995-06-02
JPH07226358A	1995-08-22
JP2003267900A	2003-09-25
JPS57146766A	1982-09-10

Other References: