ROD FOR ELECTRON SOURCE, ELECTRON SOURCE, AND ELECTRONIC APPLIANCE

WIPO Patent Application WO/2011/040326

A1

Provided is an electron source which works at lower temperatures and which has a narrower energy spread and a low work function. The electron source is characterized by being equipped with an insulator, two conductive terminals attached to the insulator, a filament attached to the conductive terminals so as to connect the conductive terminals, and a rod attached to the filament and constituted of a <100>-orientation single crystal of at least one metal selected from a group consisting of tungsten, molybdenum, tantalum, and rhenium. The electron source is further characterized in that the rod has, formed at the tip, an electron-emitting surface with an exposed {100} crystal plane, that the rod has a diffusion source attached to the middle of the rod, and that the diffusion source comprises a composite oxide formed from barium oxide and scandium oxide, the proportion of the barium oxide used for forming the composite oxide being 50 mol% or more in terms of BaO and the proportion of the scandium oxide used therefor being 10-50 mol% in terms of Sc2O3.

MORISHITA TOSHIYUKI (JP)

PCT/JP2010/066534

April 07, 2011

September 24, 2010

Click for automatic bibliography generation  

DENKI KAGAKU KOGYO KK (JP)
MORISHITA TOSHIYUKI (JP)

H01J1/304; H01J37/073

JP2004265614A	2004-09-24
JPH01102829A	1989-04-20
JP2005222945A	2005-08-18
JP2008098087A	2008-04-24
JPH03250724A	1991-11-08
JP2005024515A	2005-01-27

J. PAWLEY, JOURNAL OF MICROSCOPY, vol. 136, 1984, pages 45
R. D. YOUNG, PHYS. REV., vol. 113, 1959, pages 110
See also references of EP 2485238A4

WATANABE KAORU (JP)
Kaoru Watanabe (JP)

View/Download PDF      PDF Help

Previous Patent: DC POWER SUPPLY FEEDING SYSTEM

Next Patent: FLOW RATE SENSOR