ROLL WITH PATTERN AND METHOD FOR PRODUCING SAME

WIPO Patent Application WO/2015/076180

A1

Provided are: a roll with a pattern, which has excellent releasability of a photosensitive material during a photosensitive material releasing process during the production of this roll with a pattern and excellent releasability of a material that is transferred using this roll with a pattern, while solving the problem of side etching; and a method for producing this roll with a pattern. A photosensitive material is applied to the surface of a base, said surface being configured of a conductive DLC layer, and a resist pattern is formed by exposing and developing the photosensitive material. A DLC coating film is formed on the surfaces of the conductive DLC layer and the resist pattern, and the DLC coating film formed on the resist pattern is removed together with the resist pattern, thereby forming a DLC pattern on the surface of the conductive DLC layer.

WO/1997/050280	THICK-FILM CONDUCTOR CIRCUIT AND PRODUCTION METHOD THEREFOR
JPH06186740	COMPOSITION WHICH CAN BE DEVELOPED WITH WATER-BASED DEVELOPER
WO/2008/024573	SYSTEM AND METHOD FOR PERFORMING HIGH FLOW RATE DISPENSATION OF A CHEMICAL ONTO A PHOTOLITHOGRAPHIC COMPONENT

SUGAWARA SHINTARO (JP)
YONEKURA DAICHI (JP)

PCT/JP2014/080100

May 28, 2015

November 13, 2014

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THINK LABS KK (JP)

G03F7/00; B29C59/04; B41N1/22; C25D1/10; C25D7/06; G03F7/26

WO2013176029A1

2013-11-28

JP2012154964A	2012-08-16
JP2008111173A	2008-05-15
JP2007118593A	2007-05-17

ISHIHARA, Shinsuke et al. (JP)
Shinsuke Ishihara (JP)

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