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Patent Searching and Data


Title:
ROTARY ATOMIZING HEAD, ROTARY ATOMIZING HEAD MANAGING SYSTEM, AND ROTARY ATOMIZING HEAD MANAGING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/020755
Kind Code:
A1
Abstract:
This rotary atomizing head used in a rotary atomizing head type painting device is provided with: an atomizing head main body formed in a bell shape or a cup shape; an attachment part which is connected to the atomizing head main body and attaches the atomizing head main body to a motor rotary shaft of the rotary atomizing head type painting device; and a resin mold in which an IC tag containing unique information about the rotary atomizing head stored therein is embedded, and which is attached to the attachment part, wherein the attachment part can have a prescribed structure, the resin mold is attached to the attachment part through a prescribed method, and the IC tag is embedded in the resin mold such that the surface of an embedded coil antenna adopts a prescribed state. In this rotary atomizing head managing system composed of a rotary atomizing head used in a rotary atomizing head type painting device, and a management device which manages the rotary atomizing head, the rotary atomizing head is provided with an atomizing head main body formed in a bell shape or a cup shape, an attachment part which is connected to the atomizing head main body and attaches the atomizing head main body to a motor rotary shaft of the rotary atomizing head type painting device, and a resin mold in which an IC tag containing unique information about the rotary atomizing head stored therein is embedded, and which is attached to the attachment part; and the management device is provided with at least an IC tag communication means for executing communication with the IC tag.

Inventors:
YAMAUCHI, Shigeru (1-2-1, Osaki, Shinagawa-k, Tokyo 72, 〒1418672, JP)
SARUYAMA, Masaaki (1-2-1, Osaki, Shinagawa-k, Tokyo 72, 〒1418672, JP)
KITAGAWA, Masaaki (2-1-1 Osaki, Shinagawa-k, Tokyo 22, 〒1416022, JP)
NOMURA, Shinya (2-1-1 Osaki, Shinagawa-k, Tokyo 22, 〒1416022, JP)
Application Number:
JP2017/015479
Publication Date:
February 01, 2018
Filing Date:
April 17, 2017
Export Citation:
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Assignee:
HITACHI SYSTEMS, LTD. (1-2-1, Osaki Shinagawa-k, Tokyo 72, 〒1418672, JP)
ABB K.K. (2-1-1, Osaki Shinagawa-k, Tokyo 22, 〒1416022, JP)
International Classes:
B05B3/10; B05B5/04; B05B12/00; G06K19/077; G06Q10/00
Attorney, Agent or Firm:
IAT WORLD PATENT LAW FIRM (7th Floor, HULIC Nakano Bldg. 44-18 Honcho 4-chom, Nakano-ku Tokyo 12, 〒1640012, JP)
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