Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ROTARY PROCESSING DEVICE, ROTARY PROCESSING SYSTEM, AND ROTARY PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/035771
Kind Code:
A1
Abstract:
A rotary processing device (1) comprises a container (1A), a rotating holding mechanism (7), a processing fluid discharge arm (30), guide walls (16, 17), and air cylinders (22, 23) to reduce the area occupied by the device and a processing time.  The rotating holding mechanism (7) horizontally holds and rotates a substrate to be processed (3) loaded from the opening section (37) of the container (1A).  The guide walls (16, 17) are coaxially disposed on the outer periphery of the rotating holding mechanism (7), and separates and discharges the waste liquid of the processing fluid discharged from the processing fluid discharge arm (30).  The air cylinders (22, 23) lift up and down the respective guide walls (16, 17) between a collecting position where the top ends thereof are positioned above the substrate to be processed (3) and a retrieving position where the top ends are below the substrate to be processed.  The outermost peripheral guide wall (17) closes the opening section (37) at the collecting position, and opens the opening section (37) at the retrieving position.

Inventors:
YAMABE Hiroshi (6186, Kinoko-cho, Ibara-sh, Okayama 03, 〒7158603, JP)
Application Number:
JP2009/066599
Publication Date:
April 01, 2010
Filing Date:
September 25, 2009
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TAZMO CO., LTD. (6186, Kinoko-cho Ibara-sh, Okayama 03, 〒7158603, JP)
タツモ株式会社 (〒03 岡山県井原市木之子町6186番地 Okayama, 〒7158603, JP)
International Classes:
H01L21/304; B08B3/02; H01L21/027; H01L21/306
Attorney, Agent or Firm:
Kaede Patent Attoneys' Office (1-4-34, Noninbashi Chuo-k, Osaka-shi Osaka 11, 〒5400011, JP)
Download PDF:



 
Previous Patent: OPTICAL GLASS

Next Patent: CYLINDER CLEANING DEVICE