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Title:
ROTATING MACHINE AND METHOD FOR ATTACHING ATMOSPHERIC RELEASE MECHANISM OF ROTATING MACHINE
Document Type and Number:
WIPO Patent Application WO/2013/161123
Kind Code:
A1
Abstract:
The objective of the present invention is to provide a rotating machine equipped with an atmospheric release mechanism with which damage can be prevented when a rupture disk is attached, and which can withstand long-term use, and to provide a method for attaching an atmospheric release mechanism of a rotating machine. This rotating machine is equipped with a casing, and atmospheric release mechanisms (20) that cover atmospheric release apertures (12) provided in the casing and allow an internal fluid to be released to the atmosphere when the pressure inside the casing rises. The atmospheric release mechanisms (20) are constructed so as to include: a rupture disk (24) that ruptures when the pressure within the casing reaches a predetermined pressure; two circular clamping parts (22, 27) arranged so as to clamp the outer edge of the rupture disk (24) from both sides; multiple fastening members (29) that fasten the two circular clamping parts (22, 27), thereby clamping the rupture disk (24) between the two circular clamping parts (22, 27); and a circular spacer part (25) provided along the outer periphery of the rupture disk (24).

Inventors:
MIHARA RYOJI (JP)
FUJII SYOTA (JP)
FUKUMORI HIDEKI (JP)
Application Number:
PCT/JP2012/082847
Publication Date:
October 31, 2013
Filing Date:
December 18, 2012
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND LTD (JP)
International Classes:
F01D25/24; F01D25/30
Domestic Patent References:
WO2001012955A12001-02-22
Foreign References:
JPH02126001U1990-10-17
JPH1144371A1999-02-16
JP2010004656A2010-01-07
JP2007205772A2007-08-16
JP2010121697A2010-06-03
JP2010270761A2010-12-02
JP2011246871A2011-12-08
Attorney, Agent or Firm:
SEISHIN IP PATENT FIRM, P. C. (JP)
誠真 IP patent business corporation (JP)
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