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Patent Searching and Data


Title:
RUBBER COMPOSITION, MODIFIED DIENE-BASED POLYMER AND METHOD FOR PRODUCING MODIFIED DIENE-BASED POLYMER
Document Type and Number:
WIPO Patent Application WO/2019/082895
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a rubber composition having excellent processability and silica dispersibility, a modified diene-based polymer, and a method for producing the modified diene-based polymer. The present invention provides: a rubber composition containing silica and a modified diene-based polymer having a group expressed by formula (I) and a group expressed by formula (II); the modified diene-based polymer; and a method for producing the same. In formula (I), X1 represents at least one type selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom, X3 represents a hydrocarbon group, n3 represents 0 to 4, and X2 represents at least one type selected from the group consisting of a sulfone-based protecting group, a carbamate-based protecting group, and -(R-O)n4-H. In formula (II), R1-1 represents a divalent hydrocarbon group, R1-2 and R1-3 each independently represent a monovalent hydrocarbon group, m1 is 1 to 3, m2 is 0 to 2, m1+m2 is 3, and R1-4 represents a hydrogen atom or a hydrocarbon group.

Inventors:
KAGEYAMA Hirokazu (C/O The Yokohama Rubber Co, LTD. Hiratsuka Factory 2-1, Oiwake, Hiratsuka Cit, Kanagawa 01, 〒2548601, JP)
KIMURA Kazushi (C/O The Yokohama Rubber Co, LTD. Hiratsuka Factory 2-1, Oiwake, Hiratsuka Cit, Kanagawa 01, 〒2548601, JP)
Application Number:
JP2018/039369
Publication Date:
May 02, 2019
Filing Date:
October 23, 2018
Export Citation:
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Assignee:
THE YOKOHAMA RUBBER CO., LTD. (36-11, Shimbashi 5-chome Minato-k, Tokyo 85, 〒1058685, JP)
International Classes:
C08L15/00; B60C1/00; C08C19/22; C08C19/25; C08K3/36
Foreign References:
JP2014040514A2014-03-06
JPH05222695A1993-08-31
JP2014055264A2014-03-27
JP2003268333A2003-09-25
JPH10251476A1998-09-22
JP2000505120A2000-04-25
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (XYMAX Iwamoto-cho Building 6F, 3-3 Iwamoto-cho 2-chome, Chiyoda-k, Tokyo 32, 〒1010032, JP)
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