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Title:
RUTHENIUM COMPLEX AND METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING RUTHENIUM-CONTAINING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2014/088108
Kind Code:
A1
Abstract:
Provided are: a ruthenium complex represented by general formula (1a), (2), (3) or the like, which is useful for the production of a ruthenium-containing thin film under conditions in which an oxidizing gas is used as a reaction gas or under conditions in which a reducing gas is used as a reaction gas; and a method for producing the ruthenium complex. (In the formulae, R1a to R7a, R8 to R9 and R10 to R18 independently represent an alkyl group having 1 to 6 carbon atoms or the like; and n represents an integer of 0 to 2.)

Inventors:
TADA Kenichi (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
YAMAMOTO Toshiki (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
OIKE Hiroyuki (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
MANIWA Atsushi (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
CHIBA Hirokazu (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
IWANAGA Kohei (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
KAWANO Kazuhisa (2743-1 Hayakawa, Ayase-sh, Kanagawa 93, 〒2521193, JP)
Application Number:
JP2013/082889
Publication Date:
June 12, 2014
Filing Date:
December 06, 2013
Export Citation:
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Assignee:
TOSOH CORPORATION (4560, Kaisei-cho Shunan-sh, Yamaguchi 01, 〒7468501, JP)
SAGAMI CHEMICAL RESEARCH INSTITUTE (2743-1, Hayakawa Ayase-sh, Kanagawa 93, 〒2521193, JP)
International Classes:
C07F15/00; C23C16/18; H01L21/316; H01L21/318
Foreign References:
JP2011106008A2011-06-02
JP2010513467A2010-04-30
JP2009046440A2009-03-05
JP2008516956A2008-05-22
JP2003342286A2003-12-03
JP3649441B12005-05-18
JP2003342286A2003-12-03
JPH11209314A1999-08-03
Other References:
See also references of EP 2930179A4
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Attorney, Agent or Firm:
SHIN-EI PATENT FIRM, P.C. (Toranomon East Bldg. 8F, 7-13 Nishi-Shimbashi 1-chome, Minato-k, Tokyo 03, 〒1050003, JP)
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