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Title:
RUTHENIUM COMPOUND HAVING EXCELLENT STEP COVERAGE, AND THIN FILM DEPOSITED USING SAME
Document Type and Number:
WIPO Patent Application WO/2013/058451
Kind Code:
A1
Abstract:
The present invention relates to a ruthenium compound that includes a specific ligand structure of 1-ethyl-1,4-cyclohexadienedione, 1,3-butadiene, or isoprene, and has excellent thermal stability, vaporizing properties and step coverage, and also relates to a thin film deposited using the ruthenium compound.

Inventors:
PARK, Jung Woo (522-505, Jamsil 5 Danji Apt. Jamsil 3-dong, Songpa-gu, Seoul 138-917, 138-917, KR)
박정우 (138-917 서울특별시 송파구 잠실3동 잠실5단지아파트 522-505, Seoul, 138-917, KR)
KIM, Jun Young (303 Haneulvil 1009-6, Seosin-dong Wansan-gu, Jeonju-si, Jeollabuk-do 560-823, 560-823, KR)
김준영 (560-823 전라북도 전주시 완산구 서신동 1009-6번지 하늘빌 303호, Jeollabuk-do, 560-823, KR)
Application Number:
KR2012/002390
Publication Date:
April 25, 2013
Filing Date:
March 30, 2012
Export Citation:
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Assignee:
HANSOL CHEMICAL CO., LTD. (816 Yongam-ri, Sanggwan-myeon Wanju-gun, Jeollabuk-do 565-904, 565-904, KR)
주식회사 한솔케미칼 (565-904 전라북도 완주군 상관면 용암리 816, Jeollabuk-do, 565-904, KR)
PARK, Jung Woo (522-505, Jamsil 5 Danji Apt. Jamsil 3-dong, Songpa-gu, Seoul 138-917, 138-917, KR)
박정우 (138-917 서울특별시 송파구 잠실3동 잠실5단지아파트 522-505, Seoul, 138-917, KR)
KIM, Jun Young (303 Haneulvil 1009-6, Seosin-dong Wansan-gu, Jeonju-si, Jeollabuk-do 560-823, 560-823, KR)
International Classes:
C07F15/00; C23C16/18; C23C16/44
Domestic Patent References:
WO2008078296A1
Foreign References:
KR20100060482A
KR20090082543A
KR20100071463A
JP2009046440A
Attorney, Agent or Firm:
HALLA PATENT&LAW FIRM (9F KAMCO Yangjae Tower, 949-3 Dogok-dong Gangnam-gu, Seoul 135-270, 135-270, KR)
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Claims: