Title:
RUTHENIUM COMPOUND HAVING EXCELLENT STEP COVERAGE, AND THIN FILM DEPOSITED USING SAME
Document Type and Number:
WIPO Patent Application WO/2013/058451
Kind Code:
A1
Abstract:
The present invention relates to a ruthenium compound that includes a specific ligand structure of 1-ethyl-1,4-cyclohexadienedione, 1,3-butadiene, or isoprene, and has excellent thermal stability, vaporizing properties and step coverage, and also relates to a thin film deposited using the ruthenium compound.
Inventors:
PARK JUNG WOO (KR)
KIM JUN YOUNG (KR)
LEE KWANG DEOK (KR)
JIN WHEE WON (KR)
KIM JUN YOUNG (KR)
LEE KWANG DEOK (KR)
JIN WHEE WON (KR)
Application Number:
PCT/KR2012/002390
Publication Date:
April 25, 2013
Filing Date:
March 30, 2012
Export Citation:
Assignee:
HANSOL CHEMICAL CO LTD (KR)
PARK JUNG WOO (KR)
KIM JUN YOUNG (KR)
LEE KWANG DEOK (KR)
JIN WHEE WON (KR)
PARK JUNG WOO (KR)
KIM JUN YOUNG (KR)
LEE KWANG DEOK (KR)
JIN WHEE WON (KR)
International Classes:
C07F15/00; C23C16/18; C23C16/44
Domestic Patent References:
| WO2008078296A1 | 2008-07-03 |
Foreign References:
| KR20100060482A | 2010-06-07 | |||
| KR20090082543A | 2009-07-31 | |||
| KR20100071463A | 2010-06-29 | |||
| JP2009046440A | 2009-03-05 |
Attorney, Agent or Firm:
HALLA PATENT&LAW FIRM (KR)
한라특허법인 (KR)
한라특허법인 (KR)
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Claims: