RUTHENIUM COMPOUNDS, PROCESS FOR THEIR PREPARATION, AND RUTHENIUM-CONTAINING THIN FILMS MADE BY USING THE COMPOUNDS

Title:

RUTHENIUM COMPOUNDS, PROCESS FOR THEIR PREPARATION, AND RUTHENIUM-CONTAINING THIN FILMS MADE BY USING THE COMPOUNDS

Document Type and Number:

WIPO Patent Application WO/2003/057706

Kind Code:

A1

Abstract:

Bis(cyclopentadienyl)ruthenium complex having a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100ppm of rhenium. The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium -containing thin films.

Inventors:

HIRAKOSO HIDEYUKI (JP)
ISHIKAWA MASAYUKI (JP)
YANAGISAWA AKIO (JP)
OGI KATSUMI (JP)

Application Number:

PCT/JP2003/000074

Publication Date:

July 17, 2003

Filing Date:

January 08, 2003

Export Citation:

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Assignee:

MITSUBISHI MATERIALS CORP (JP)
HIRAKOSO HIDEYUKI (JP)
MASAYUKI ISHIKAWA (JP)
YANAGISAWA AKIO (JP)
OGI KATSUMI (JP)

International Classes:

C07F17/02; C23C16/18; C23C16/44; (IPC1-7): C07F17/02; C07F15/00; C23C16/18

Domestic Patent References:

WO2001042261A1	2001-06-14
WO2002088152A1	2002-11-07

Foreign References:

US3306917A	1967-02-28
US20010050391A1	2001-12-13
US5770752A	1998-06-23
US20010036509A1	2001-11-01

Attorney, Agent or Firm:

Shiga, Masatake (2-3-1 Yaesu Chuo-ku, Tokyo, JP)

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