Title:
SPUTTERING TARGET COMPRISING Al-Te-Cu-Zr ALLOY, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2015/146311
Kind Code:
A1
Abstract:
An Al-Te-Cu-Zr alloy sputtering target characterized by comprising 20 to 40 at% of Te, 5 to 20 at% of Cu, 5 to 15 at% of Zr and a remainder made up by Al, wherein a Te phase, a Cu phase and a CuTe phase do not exist in the target structure. The present invention addresses the problem of providing: an Al-Te-Cu-Zr alloy sputtering target which enables the effective prevention of the formation of particles, the formation of nodules and the like during sputtering, and which contains oxygen in a reduced amount; and a method for producing the Al-Te-Cu-Zr alloy sputtering target.
Inventors:
KOIDO YOSHIMASA (JP)
Application Number:
PCT/JP2015/053326
Publication Date:
October 01, 2015
Filing Date:
February 06, 2015
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22C21/00; C22C30/02; H01L27/105; H01L45/00; H01L49/00
Domestic Patent References:
| WO2010026924A1 | 2010-03-11 | |||
| WO2013035695A1 | 2013-03-14 |
Foreign References:
| JP2012142543A | 2012-07-26 | |||
| JP2011124511A | 2011-06-23 | |||
| JP2011026679A | 2011-02-10 |
Other References:
See also references of EP 3124647A4
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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