Title:
SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, AND Ta, AND METHODS
Document Type and Number:
WIPO Patent Application WO/2016/115026
Kind Code:
A3
Abstract:
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly with respect to etching, such as when simultaneously etching an alloy layer including the Mo, Nb, and Ta, and a metal layer (e.g., an aluminum layer). The targets are particularly useful in manufacturing touch screen devices.
Inventors:
SUN SHUWEI (US)
ROZAK GARY ALAN (US)
ZHANG QI (US)
COX BARBARA (US)
LEE YEN-TE (TW)
ROZAK GARY ALAN (US)
ZHANG QI (US)
COX BARBARA (US)
LEE YEN-TE (TW)
Application Number:
PCT/US2016/012824
Publication Date:
September 09, 2016
Filing Date:
January 11, 2016
Export Citation:
Assignee:
STARCK H C INC (US)
International Classes:
C23C14/08; C22C27/04; C23C14/14; C23C14/34; G06F3/00
Foreign References:
| US20120003486A1 | 2012-01-05 | |||
| CN104439247A | 2015-03-25 | |||
| KR20150005316A | 2015-01-14 |
Attorney, Agent or Firm:
FINERMAN, Terry, M. et al. (PC29 W. Lawrence Street, Suite 21, Pontiac MI, US)
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