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Patent Searching and Data


Title:
SACRIFICAL DEVICE FOR PROTECTING AN OPTICAL ELEMENT IN A PATH OF A HIGH-POWER LASER BEAM
Document Type and Number:
WIPO Patent Application WO/2020/126387
Kind Code:
A3
Abstract:
A system is configured to form a path for laser radiation (602). The system has an optical element (604) positioned in the path, and a sacrificial device (606) also positioned in the path and configured to protect the optical element.

Inventors:
MUYS PETER (NL)
Application Number:
PCT/EP2019/082875
Publication Date:
July 30, 2020
Filing Date:
November 28, 2019
Export Citation:
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Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
H05G2/00; H01S3/00; H01S3/034
Foreign References:
US20140269794A12014-09-18
US20140084186A12014-03-27
US20060192151A12006-08-31
US20150146866A12015-05-28
Other References:
GOLDFARB DARIO L ET AL: "Thermomechanical behavior of EUV pellicle under dynamic exposure conditions", PROCEEDINGS OF SPIE; [PROCEEDINGS OF SPIE ISSN 0277-786X VOLUME 10524], SPIE, US, vol. 9776, 18 March 2016 (2016-03-18), pages 977621 - 977621, XP060067595, ISBN: 978-1-5106-1533-5, DOI: 10.1117/12.2218453
Attorney, Agent or Firm:
CRESPILLO MIRON, Carlos (NL)
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