SAMPLE HOLDER, ION MILLING APPARATUS, SAMPLE PROCESSING METHOD, SAMPLE OBSERVATION METHOD, AND SAMPLE PROCESSING/OBSERVATION METHOD

WIPO Patent Application WO/2017/134764

A1

Proposed is a side-entry-type sample holder that enables an observation apparatus to observe an analysis sample without being removed from the sample holder after the analysis sample has been processed by a processing apparatus. This sample holder is provided with: a grip (34); a sample holder body (35) that extends from the grip (34); a leading end part (32) which is connected to the sample holder body (35) and in which a sample table (204) for fixing a sample (203) is provided; and a mechanism for preventing the leading end part (32) from being irradiated with an ion beam during processing of the sample (203) by changing a relative positional relationship between the processing surface of the sample (203) fixed to the sample table (204) and an ion beam irradiation direction (see FIG. 3).

JP3105670	CHARGED PARTICLE BEAM EXPOSURE DEVICE AND CONTROLLING METHOD THEREFOR
WO/2018/083322	DEVICE FOR EXTRACTING ELECTRICAL CHARGE CARRIERS FROM A CHARGE CARRIER GENERATING SPACE

KAMINO ATSUSHI (JP)
TAKASU HISAYUKI (JP)

PCT/JP2016/053165

August 10, 2017

February 03, 2016

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HITACHI HIGH TECH CORP (JP)

H01J37/305; H01J37/20

JP2005043382A	2005-02-17
JP2013080605A	2013-05-02

HIRAKI Yusuke et al. (JP)

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