SAMPLE OBSERVATION METHOD USING ELECTRON BEAMS AND ELECTRON MICROSCOPE

WIPO Patent Application WO/2011/058950

A1

Disclosed is a method for observing the structure or characteristics of a sample by means of an electron microscope, wherein it is possible to densely accumulate charge onto the sample, and to improve the image quality for potential contrast. When performing charge treatment on a sample during the evaluation of the electrical properties and observation of the structure of the sample using electron beams, a sample is irradiated with electron beams set at an incident energy which is within an incident energy band having a high charge storage efficiency during electron beam irradiation, and the irradiation energy is changed while maintaining the incident energy thereof, thereby being able to densely accumulate charge onto the sample.

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TSUNO NATSUKI (JP)
MAKINO HIROSHI (JP)
SUZUKI MAKOTO (JP)
OMINAMI YUSUKE (JP)

PCT/JP2010/069845

May 19, 2011

November 08, 2010

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HITACHI HIGH TECH CORP (JP)
TSUNO NATSUKI (JP)
MAKINO HIROSHI (JP)
SUZUKI MAKOTO (JP)
OMINAMI YUSUKE (JP)

H01J37/28; H01J37/20

JP2007265931A	2007-10-11
JP2005333161A	2005-12-02
JP2004014485A	2004-01-15
JP2006234789A	2006-09-07

POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)

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