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Title:
SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
Document Type and Number:
WIPO Patent Application WO/2019/155834
Kind Code:
A1
Abstract:
This sample support (1) is for ionization of a sample. The sample support is provided with a substrate (2) having a mutually opposite first surface (2a) and second surface (2b), a first conduction layer (41) provided on the first surface, and a second conduction layer (42) provided on the second surface. In a prescribed region of the substrate for ionizing a component of the sample, multiple through-holes (20) are formed that open to the first surface and the second surface, and in each of the multiple through holes, the width of a first opening (20a) on the first surface side is greater than the width of a second opening (20b) on the second surface side.

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Inventors:
KOTANI MASAHIRO (JP)
OHMURA TAKAYUKI (JP)
Application Number:
PCT/JP2019/001113
Publication Date:
August 15, 2019
Filing Date:
January 16, 2019
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G01N27/62; H01J49/04
Domestic Patent References:
WO2017038709A12017-03-09
Foreign References:
JP2009080106A2009-04-16
JP3122331U2006-06-08
JP2004354376A2004-12-16
JP6093492B12017-03-08
Other References:
See also references of EP 3751275A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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