Title:
SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
Document Type and Number:
WIPO Patent Application WO/2019/155836
Kind Code:
A1
Abstract:
This sample support (1) is for ionization of a sample. The sample support is provided with a substrate (2) having a mutually opposite first surface (2a) and second surface (2b), and a conduction layer (4) provided at least on the first surface. In an effective region of the substrate for ionizing a component of the sample, multiple through-holes (20) are formed that open to the first surface and the second surface, and in each of the multiple through-holes, the width of first openings on the first surface side is greater than the width of second openings on the second surface side.
Inventors:
KOTANI MASAHIRO (JP)
OHMURA TAKAYUKI (JP)
OHMURA TAKAYUKI (JP)
Application Number:
PCT/JP2019/001115
Publication Date:
August 15, 2019
Filing Date:
January 16, 2019
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G01N27/62; G01N27/64; H01J49/04; H01J49/16
Domestic Patent References:
WO2017038709A1 | 2017-03-09 |
Foreign References:
JP2009080106A | 2009-04-16 | |||
JP3122331U | 2006-06-08 | |||
JP2007309860A | 2007-11-29 | |||
US20080179513A1 | 2008-07-31 | |||
JP6093492B1 | 2017-03-08 |
Other References:
See also references of EP 3751272A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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