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Title:
SAMPLE SUPPORT, SAMPLE IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
Document Type and Number:
WIPO Patent Application WO/2020/026629
Kind Code:
A1
Abstract:
A sample support is for ionization of a sample and comprises: a substrate in which a plurality of through-holes opening on a first surface and on a second surface opposite to the first surface are formed, a conductive layer provided so as not to block the through-holes on the first surface, and a reinforcing material disposed inside some of the through-holes among the plurality of through-holes.

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Inventors:
TAKIMOTO MIU (JP)
OHMURA TAKAYUKI (JP)
KOTANI MASAHIRO (JP)
Application Number:
PCT/JP2019/024361
Publication Date:
February 06, 2020
Filing Date:
June 19, 2019
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G01N27/62; H01J49/04; H01J49/16
Foreign References:
JP6093492B12017-03-08
JP2017122732A2017-07-13
JP2013228403A2013-11-07
US20020160536A12002-10-31
JP2009504161A2009-02-05
JP2017004786A2017-01-05
JP2010175338A2010-08-12
JP2014153183A2014-08-25
JP2010071727A2010-04-02
JP6093492B12017-03-08
JPS5129628B11976-08-26
Other References:
See also references of EP 3832300A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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