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Title:
SAMPLE SUPPORT, AND MANUFACTURING METHOD OF SAMPLE SUPPORT
Document Type and Number:
WIPO Patent Application WO/2019/155740
Kind Code:
A1
Abstract:
This sample support for ionization of a sample is provided with a substrate in which multiple first through-holes are formed that open in a mutually opposite first surface and second surface, and a conduction layer which is provided at least on the periphery of the first through-holes in the first surface, wherein multiple second through-holes that communicate between mutually adjacent first through-holes are formed in wall sections disposed between the mutually adjacent first through-holes.

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Inventors:
KOTANI MASAHIRO (JP)
OHMURA TAKAYUKI (JP)
Application Number:
PCT/JP2018/044298
Publication Date:
August 15, 2019
Filing Date:
November 30, 2018
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G01N27/62
Domestic Patent References:
WO2017038710A12017-03-09
Foreign References:
JP2005500507A2005-01-06
US20110123411A12011-05-26
JP6093492B12017-03-08
Other References:
ONO, SACHIKO: "Structure and growth mechanism of porous anodic oxide films-Anodizing of aluminum and magnesium", JOURNAL OF THE SURFACE SCIENCE SOCIETY OF JAPAN, vol. 19, no. 12, 1998, pages 790 - 798, XP055630437
See also references of EP 3751268A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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