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Patent Searching and Data


Title:
SCALP ENVIRONMENT IMPROVEMENT DEVICE AND SCALP ENVIRONMENT IMPROVEMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2018/042698
Kind Code:
A1
Abstract:
Provided is a scalp environment improvement device, comprising: a housing (1), further comprising an intake aperture (11) and a discharge aperture (12); a charged particle emission unit (13) which is positioned within the housing (1), and which is for emitting charged particles; a ventilation unit (14) which is positioned within the housing (1), and which is for sending the charged particles outside the housing (1) from the discharge aperture (12); and a scalp contact body (3) which is positioned externally to the housing (1). Among the scalp contact body (3), at least a contact part which makes contact with the scalp of a user is positioned within a flow path of the charged particles which are sent outside the housing from the discharge aperture.

Inventors:
FUNAMORI HIROKAZU
Application Number:
PCT/JP2017/003787
Publication Date:
March 08, 2018
Filing Date:
February 02, 2017
Export Citation:
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Assignee:
SHARP KK (JP)
International Classes:
A45D20/12
Domestic Patent References:
WO2008014577A12008-02-07
Foreign References:
JP2012016468A2012-01-26
JP3184955U2013-07-25
GB2259007A1993-03-03
JP3207005U2016-10-13
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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