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Title:
SCANNING ELECTRON MICROSCOPE SYSTEM AND DEPTH MEASUREMENT METHOD FOR PATTERN
Document Type and Number:
WIPO Patent Application WO/2019/194305
Kind Code:
A1
Abstract:
A scanning electron microscope system comprising: a primary electron beam radiation means that radiates a primary electron beam at a first pattern on a substrate that has a second pattern formed at a peripheral region of the first pattern; a detection means that detects backscattered electrons that have been emitted from the substrate irradiated with the primary electron beam by the primary electron beam radiation means; an image generation means that generates an electron beam image corresponding to the strength of the backscattered electrons detected by the detection means; a designation means that designates, within the electron beam image generated by the image generation means, a depth measurement region in which the first pattern is present; and a processing means that obtains an image signal for the depth measurement region and a pattern density for the peripheral region in which the second pattern is present, and estimates the depth of the first pattern within the depth measurement region on the basis of the obtained image signal for the depth measurement region and the pattern density for the peripheral region.

Inventors:
NISHIHATA Takahiro (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
OSAKI Mayuka (6-6, Marunouchi 1-chome, Chiyoda-k, Tokyo 80, 〒1008280, JP)
YAMAMOTO Takuma (24-14 Nishi-Shimbashi 1-chome, Minato-k, Tokyo 17, 〒1058717, JP)
HAMAGUCHI Akira (1-1 Shibaura 1-chome, Minato-k, Tokyo 23, 〒1050023, JP)
IIDA Yusuke (1-1 Shibaura 1-chome, Minato-k, Tokyo 23, 〒1050023, JP)
Application Number:
JP2019/015151
Publication Date:
October 10, 2019
Filing Date:
April 05, 2019
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi-Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
International Classes:
H01J37/22; G01B15/02; H01J37/28
Foreign References:
JP2015106530A2015-06-08
JP2013120169A2013-06-17
JP2013044547A2013-03-04
JP2001201318A2001-07-27
US20130234021A12013-09-12
US20170162363A12017-06-08
US20170199137A12017-07-13
US20040026619A12004-02-12
Attorney, Agent or Firm:
SEIRYO I.P.C. (24-2, Hatchobori 2-chome Chuo-k, Tokyo 32, 〒1040032, JP)
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