Title:
SCANNING ELECTRON MICROSCOPE
Document Type and Number:
WIPO Patent Application WO/2020/008492
Kind Code:
A1
Abstract:
To make it possible, in a scanning electron microscope in which an electron beam having a high energy is used, to correct the focal point at a high speed. This invention has: an electron optical system including an objective lens 113 and an electron source 100 for releasing an electron beam 116; a sample stand 1025 disposed on a stage 115, a sample 114 being placed on the sample stand 1025; a reflected electron detector 1023 disposed between the objective lens and the sample stand, the reflected electron detector 1023 detecting reflected electrons 1017 released by an interaction between the electron beam and the sample; a reflected electron detection system control unit 138 provided so as to correspond to the reflected electron detector, the reflected electron detection system control unit applying a voltage onto the reflected electron detector; and a device control computation device 146. The objective lens has an opening in the stage direction, and the device control computation device controls the voltage applied from the reflected electron detection system control unit to the reflected electron detector and thereby performs a correction of the focal point of the electron beam.
Inventors:
SOHDA YASUNARI (JP)
BIZEN KAORI (JP)
ABE YUSUKE (JP)
TANIMOTO KENJI (JP)
BIZEN KAORI (JP)
ABE YUSUKE (JP)
TANIMOTO KENJI (JP)
Application Number:
PCT/JP2018/025029
Publication Date:
January 09, 2020
Filing Date:
July 02, 2018
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/21; H01J37/244
Foreign References:
| EP2833390A1 | 2015-02-04 | |||
| JPH01309243A | 1989-12-13 | |||
| JP2015210998A | 2015-11-24 | |||
| JP2005158642A | 2005-06-16 | |||
| JP2014022165A | 2014-02-03 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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