SCANNING EXPOSURE APPARATUS, MICRO DEVICE MANUFACTURING METHOD, MASK, PROJECTION OPTICAL APPARATUS AND MASK MANUFACTURING METHOD

WIPO Patent Application WO/2007/108420

A1

A scanning exposure apparatus transfers and exposes the pattern of a first object (M) on a second object (P), while changing positional relationship between the scanning direction of a first projection optical system (PL2) and a second projection optical system (PL1) and the scanning direction of the first object and the second object, by using the first projection optical system arranged on the front side in the scanning direction, and the second projection optical system arranged on the rear side in the scanning direction. Each of the first projection optical system and the second projection optical system forms an expanded image, which is in the visual field on the first object, on the image field on the second object, and an inequality of Dp1) is satisfied, where, (Dm) is an interval between the center of the visual field of the first projection optical system and the center of the visual field of the second projection optical system in the scanning direction, (Dp) is an interval between the center of the image field made by the first projection optical system and the center of the image field made by the second projection optical system in the scanning direction, and (β) is a projection magnification ratio of each of the first projection optical system and the second projection optical system.

JPH11174683	RESIST FILM FORMING METHOD AND RESIST
JP2003149404	OPTICAL THIN FILM, ITS MANUFACTURING METHOD, OPTICAL ELEMENT USING OPTICAL THIN FILM, OPTICAL SYSTEM, AND IMAGE PICKUP DEVICE, RECORDING DEVICE AND EXPOSURE DEVICE PROVIDED WITH OPTICAL SYSTEM
JP2004235218	MASK BLANKS, MANUFACTURING METHOD THEREOF, ETCHING DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS

KATO MASAKI (JP)

PCT/JP2007/055417

September 27, 2007

March 16, 2007

Click for automatic bibliography generation  

NIKON CORP (JP)
KATO MASAKI (JP)

G03F7/20; G02B13/14; G02B13/24; G02B17/08; G03F1/70; G03F1/76

JP2006047958A	2006-02-16
JP2005316409A	2005-11-10
JPH07183212A	1995-07-21
JP2005340605A	2005-12-08
JPH09134870A	1997-05-20
JPH11265848A	1999-09-28
JPH11265848A	1999-09-28
US5903400A	1999-05-11

See also references of EP 2003507A4

HASEGAWA, Yoshiki et al. (Ginza First Bldg. 10-6, Ginza 1-chom, Chuo-ku Tokyo 61, JP)

View/Download PDF      PDF Help

Previous Patent: PROCESS FOR PRODUCTION OF ANIONIC SURFACTANT POWDERS AND ANIONIC SURFACTANT POWDERS

Next Patent: CAMERA HAVING WIRELESS COMMUNICATION FUNCTION