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Title:
SCANNING MIRROR AND PRODUCTION METHOD FOR SCANNING MIRROR
Document Type and Number:
WIPO Patent Application WO/2020/241153
Kind Code:
A1
Abstract:
[Problem] To provide: a scanning mirror that can prevent the oxidation or hydroxylation of a torsion bar and suppress deterioration of the torsion bar caused thereby; and a production method for the scanning mirror. [Solution] A scanning mirror in which a torsion bar 25 is provided so as to support a mirror part 24 and has an ALD layer 27 covering the surface thereof. The scanning mirror is configured such that the mirror part 24 can be rotated around an axis that runs along the torsion bar 25 by applying torsional force to the torsion bar 25. The scanning mirror is produced by forming the mirror part 24 and the torsion bar 25 and then using atomic layer deposition to form an ALD layer 27 on at least the surface of the torsion bar 25.

Inventors:
HANE KAZUHIRO (JP)
SASAKI TAKASHI (JP)
FUJITA YUKI (JP)
Application Number:
PCT/JP2020/018008
Publication Date:
December 03, 2020
Filing Date:
April 27, 2020
Export Citation:
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Assignee:
UNIV TOHOKU (JP)
International Classes:
G02B26/08; B81B3/00; B81C1/00; G02B26/10
Domestic Patent References:
WO2017006425A12017-01-12
Foreign References:
JP2002040353A2002-02-06
US20070211257A12007-09-13
US20180186625A12018-07-05
JP2017171664A2017-09-28
JP3934578B22007-06-20
JPS5321740B21978-07-04
JPS5640420B11981-09-21
JPS6018926B21985-05-13
Other References:
S. GU-STOPPELD. KADENH. J. QUENZERU. HOFMANNW. BENECKE: "High speed piezoelectric microscanners with large deflection using mechanical leverage amplification", PROCEDIA ENGINEERING, vol. 47, 2012, pages 56 - 59
S. GU-STOPPELT. GIESEH. J. QUENZERU. HOFMANNW. BENECKE: "PZT-Actuated and -Sensed Resonant Micromirrors with Large Scan Angles Applying Mechanical Leverage Amplification for Biaxial Scanning", MICROMACHINES, vol. 8, 2017, pages 215, XP055825956, DOI: 10.3390/mi8070215
W. ZHANGK. OBITANIY. HIRAIT. TSUCHIYAO. TABATA: "Fracture strength of silicon torsional mirror resonators fully coated with submicrometer-thick PECVD DLC film", SENSORS AND ACTUATORS A: PHYSICA, vol. 286, 2019, pages 28 - 34
M. BUDNITZKIO. PIERRON: "The influence of nanoscale atomic-layer-deposited alumina coating on the fatigue behavior of polycrystalline silicon thin films", APPLIED PHYSICS LETTERS, vol. 94, 2009, pages 141906, XP012120750, DOI: 10.1063/1.3112565
P. F. CARCIAR. S. MCLEANM. H. REILLY: "Permeation measurements and modeling of highly defective AI2O thin films grown by atomic layer deposition on polymers", APPLIED PHYSICS LETTERS, vol. 97, 2010, pages 221901, XP012137908, DOI: 10.1063/1.3519476
Attorney, Agent or Firm:
KUSUNOKI Shuji (JP)
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