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Patent Searching and Data


Title:
SCANNING-TYPE X-RAY SOURCE AND IMAGING SYSTEM THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/001276
Kind Code:
A1
Abstract:
Provided are a scanning-type X-ray source and an imaging system therefor. The scanning-type X-ray source comprises a vacuum cavity (1), wherein a cathode (2) and a plurality of anode target structures (3) are arranged in the vacuum cavity (1); a gate electrode (4) is arranged in a position, close to the cathode (2), in the vacuum cavity (1); a focusing electrode (5) is arranged in a position, close to the gate electrode (4), in the vacuum cavity (1); and a deflection coil (6) is arranged in a position, close to the gate electrode (4), at the outer periphery of the vacuum cavity (1). The scanning-type X-ray source generates electron beams by using one cathode (2), and controls the powering-on and the powering-off of the electron beams by means of the gate electrode (4), and the deflection coil (6) controls the direction of motion of the electron beams, so that bombarding the corresponding target surfaces one by one according to a pre-set rule is achieved so as to complete the switching between multiple focuses, which not only improves the efficiency of the scanning-type X-ray source, but also satisfies the requirements of the imaging system on the scanning-type X-ray source and on the acquisition of images from a plurality of projection angles, and the problem of mechanical motion artifacts produced when a motion mechanism is used to realize rotation or translation of the X-ray source is also solved.

Inventors:
CUI ZHILI (CN)
GAO JIAN (CN)
XING JINHUI (CN)
Application Number:
PCT/CN2019/090988
Publication Date:
January 02, 2020
Filing Date:
June 12, 2019
Export Citation:
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Assignee:
NANOVISION TECH BEIJING CO LTD (CN)
International Classes:
H01J35/30; H01J35/04; H01J35/14
Foreign References:
CN108777248A2018-11-09
CN104411081A2015-03-11
CN205508764U2016-08-24
CN102645442A2012-08-22
CN103227082A2013-07-31
CN206685345U2017-11-28
JP2017027832A2017-02-02
Other References:
See also references of EP 3817027A4
Attorney, Agent or Firm:
BEIJING GENIUS ESSEN INTELLECTUAL PROPERTY OFFICE (CN)
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