Title:
SCREEN MASK AND SEMICONDUCTOR DEVICE FABRICATION METHOD
Document Type and Number:
WIPO Patent Application WO/2007/026541
Kind Code:
A1
Abstract:
It is possible to control the printing thickness partially to a desired value in
screen printing. A screen mask (30) includes a screen thin silk, a mask layer (22),
and an adjusting unit (31). The mask layer (22) is formed so as to be connected to
the screen thin silk and has a mask opening (21) corresponding to a predetermined printing
pattern. The adjusting unit (31) is formed on the mask layer (22) in such a manner
that the transparency of a paste material corresponding to a part of the predetermined
printing pattern is changed. Especially, the adjusting unit (31) is formed on
the mask layer (22) so that the pattern numerical aperture of the mask layer (22)
is changed.
Inventors:
HAZEYAMA ICHIROU (JP)
OHTSUKA TAKASHI (JP)
ONO YOSHIHIRO (JP)
MOMOKAWA YUKI (JP)
OHTSUKA TAKASHI (JP)
ONO YOSHIHIRO (JP)
MOMOKAWA YUKI (JP)
Application Number:
PCT/JP2006/316089
Publication Date:
March 08, 2007
Filing Date:
August 16, 2006
Export Citation:
Assignee:
NEC CORP (JP)
NEC ELECTRONICS CORP (JP)
HAZEYAMA ICHIROU (JP)
OHTSUKA TAKASHI (JP)
ONO YOSHIHIRO (JP)
MOMOKAWA YUKI (JP)
NEC ELECTRONICS CORP (JP)
HAZEYAMA ICHIROU (JP)
OHTSUKA TAKASHI (JP)
ONO YOSHIHIRO (JP)
MOMOKAWA YUKI (JP)
International Classes:
B41N1/24; B41C1/14; B41F15/08; B41F15/34; H01L21/60; H05K3/12
Foreign References:
| JPH09248975A | 1997-09-22 | |||
| JPH06143855A | 1994-05-24 | |||
| JPS60175659U | 1985-11-21 | |||
| JPH03126636U | 1991-12-20 |
Attorney, Agent or Firm:
KUDOH, Minoru (24-10 Minamiooi 6-chom, Shinagawa-ku Tokyo 13, JP)
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