Title:
SEALING FILM FORMATION DEVICE AND SEALING FILM FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2017/018265
Kind Code:
A1
Abstract:
Provided are a sealing film formation device and sealing film formation method that make it possible to stably form a sealing film having high barrier properties. Specifically, the present invention is provided with: a first decompression chamber 4 for accommodating a substrate W; a cover film formation unit 2 for supplying a cover film material by a wet process to the substrate W accommodated within the first decompression chamber 4, to form a cover film 93; a second decompression chamber 5 for accommodating the substrate W; a decompression conveyance path 6, which is a conveyance path for the substrate W from the first decompression chamber 4 to the second decompression chamber 5, and which is decompressed; and a sealing film formation unit 3 for forming a sealing film 90 by supplying a sealing film material by a dry process to the cover film 93 formed on the substrate W accommodated in the second decompression chamber 5.
Inventors:
YAMASHITA MASAMICHI (JP)
NAKAKITA KAZUNORI (JP)
YAMAMOTO KIYOHITO (JP)
NAKAKITA KAZUNORI (JP)
YAMAMOTO KIYOHITO (JP)
Application Number:
PCT/JP2016/071098
Publication Date:
February 02, 2017
Filing Date:
July 19, 2016
Export Citation:
Assignee:
TORAY ENG CO LTD (JP)
International Classes:
C23C16/50; B05D3/00; B05D5/00
Domestic Patent References:
| WO2008102694A1 | 2008-08-28 |
Foreign References:
| JP2010274562A | 2010-12-09 | |||
| JP2005322436A | 2005-11-17 | |||
| JP2004217970A | 2004-08-05 | |||
| JP2014214367A | 2014-11-17 | |||
| JP2008071726A | 2008-03-27 | |||
| JP2001102170A | 2001-04-13 | |||
| JP2001223077A | 2001-08-17 |
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