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Title:
SECONDARY BATTERY MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/208116
Kind Code:
A1
Abstract:
A secondary battery manufacturing method according to the present invention is a method for manufacturing a secondary battery which includes a charging layer that captures electrons by forming energy levels in a band gap by causing a photoexcited structural change in an n-type metal oxide semiconductor coated with an insulating material, the method comprising: a coating step (S1) of coating a coating liquid so as to form a coating film including components that will form the charging layer (18); a drying step (S2) of forming a post-drying coating film by drying the coating liquid coated in the coating step (S1); a UV irradiating step (S3) of irradiating the post-drying coating film that has passed through the drying step (S2) with ultraviolet light so as to form a post-UV irradiation coating film; and, after repeating a plurality of sets each including the coating step (S1), the drying step (S2), and the irradiating step (S3) to form a plurality of layers of the post-UV irradiation coating film, a baking step (S5) of baking the plurality of layers of the post-UV irradiation coating film.

Inventors:
SAITO, Tomokazu (6-8 Kichijojihon-cho 2-chome, Musashino-sh, Tokyo 08, 〒1808508, JP)
DEWA, Harutada (6-8 Kichijojihon-cho 2-chome, Musashino-sh, Tokyo 08, 〒1808508, JP)
Application Number:
JP2016/002410
Publication Date:
December 29, 2016
Filing Date:
May 17, 2016
Export Citation:
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Assignee:
KABUSHIKI KAISHA NIHON MICRONICS (6-8 Kichijojihon-cho 2-chome, Musashino-shi Tokyo, 08, 〒1808508, JP)
International Classes:
H01L49/00; B05D1/36; B05D3/02; B05D3/06
Domestic Patent References:
2012-04-12
2010-03-18
Foreign References:
JP2011023200A2011-02-03
JP2016028408A2016-02-25
Attorney, Agent or Firm:
IEIRI, Takeshi (HIBIKI IP Law Firm, Asahi Bldg. 5th Floor 3-33-8, Tsuruya-cho, Kanagawa-ku, Yokohama-sh, Kanagawa 35, 〒2210835, JP)
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