Title:
SELF-ASSEMBLED FILM FORMING COMPOSITION FOR FORMING FINE PHASE SEPARATION PATTERN
Document Type and Number:
WIPO Patent Application WO/2018/135456
Kind Code:
A1
Abstract:
Provided is a self-assembled film forming composition for orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer including a block copolymer, in the whole surface of a coating film, even at high heating temperatures at which arrangement failure of the microphase separation of the block copolymer occurs. The self-assembled film forming composition includes a block copolymer, and at least two types of solvent having different boiling points as a solvent. The block copolymer is obtained by bonding: a non-silicon-containing polymer having, as a structural unit, styrene, a derivative thereof, or a structure derived from a lactide; and a silicon-containing polymer having, as a structural unit, styrene substituted with silicon-containing groups. The solvent includes: a low boiling point solvent (A) having a boiling point of 160˚C or lower; and a high boiling point solvent (B) having a boiling point of 170˚C or higher.
Inventors:
MIZUOCHI RYUTA (JP)
SOMEYA YASUNOBU (JP)
WAKAYAMA HIROYUKI (JP)
SAKAMOTO RIKIMARU (JP)
SOMEYA YASUNOBU (JP)
WAKAYAMA HIROYUKI (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2018/000904
Publication Date:
July 26, 2018
Filing Date:
January 16, 2018
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D125/08; B05D7/24; C08F287/00; C08L53/00; H01L21/027
Domestic Patent References:
| WO2016068261A1 | 2016-05-06 |
Foreign References:
| JP2015005750A | 2015-01-08 | |||
| JP2017501267A | 2017-01-12 | |||
| JP2014186773A | 2014-10-02 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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