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Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/092541
Kind Code:
A1
Abstract:
Provided is a semiconductor device having excellent reliability. This device is provided with a first insulating body, a first oxide disposed upon the first insulating body, a second oxide disposed upon the first oxide, a first conductor and a second conductor disposed, mutually separated, upon the second oxide, a third oxide disposed upon the second oxide, the first conductor, and the second conductor, a second insulating film disposed upon the third oxide, and a third conductor disposed upon the second oxide with the third oxide and the second insulating film sandwiched therebetween, the third oxide containing a metallic element and nitrogen, and the metallic element being bound to the nitrogen.

Inventors:
YAMAZAKI SHUNPEI (JP)
HIRAMATSU TOMOKI
NONAKA YUSUKE
ISHIHARA NORITAKA
SAMBONSUGE SHOTA
YAMANE YASUMASA (JP)
ENDO YUTA
Application Number:
PCT/IB2018/058425
Publication Date:
May 16, 2019
Filing Date:
October 29, 2018
Export Citation:
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Assignee:
SEMICONDUCTOR ENERGY LAB (JP)
International Classes:
H01L29/786; H01L21/336; H01L21/8234; H01L21/8242; H01L27/06; H01L27/088; H01L27/108; H01L27/1156; H01L29/788; H01L29/792
Foreign References:
JP2014056945A2014-03-27
JP2017143239A2017-08-17
JP2017199901A2017-11-02
JP2017168839A2017-09-21
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