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Title:
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME, AND POWER CONVERSION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/185974
Kind Code:
A1
Abstract:
Provided are: a semiconductor device with which a residue of very small air bubbles generated during a resin injection step is suppressed, and it is possible to easily achieve the flow of sealing material into regions to be sealed with resin; a method for manufacturing the semiconductor device, and a power conversion device having such a semiconductor device. A semiconductor device (101) comprises an insulating substrate (2), a semiconductor element (4), a conductor substrate (3P), and a case material (1). The semiconductor element (4) is connected above the insulating substrate (2), and the conductor substrate (3P) is connected above the semiconductor element (4). The case material (1) encloses so as to surround the region in which the insulating substrate (2), the semiconductor element (4), and the conductor substrate (3P) overlap in plan view. A plurality of metal patterns (2P) are disposed on the main surface of an insulating layer (2D). A groove (2G) is formed between a pair of adjacent metal patterns (2P) among the plurality of metal patterns (2P). A through hole (7) is formed in a position on the conductor substrate (3P) overlapping with the groove (2G) in plan view.

Inventors:
KAJI YUSUKE (JP)
ROKUBUICHI HODAKA (JP)
KONDO SATOSHI (JP)
Application Number:
PCT/JP2017/043784
Publication Date:
October 11, 2018
Filing Date:
December 06, 2017
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
H01L23/28; H01L25/07; H01L25/18; H02M7/48
Foreign References:
JP2014154679A2014-08-25
JP2015046416A2015-03-12
JP2009064852A2009-03-26
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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