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Title:
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2019/176833
Kind Code:
A1
Abstract:
In order to suppress moisture absorption in a variable resistance layer included in a variable resistance element and to reduce variations in set voltage, this semiconductor device is provided with: a first electrode; a first insulation layer which is disposed on the first electrode and which has at least one opening; a variable resistance layer which is disposed on the first insulation layer and which is connected to the first electrode at a portion inside the opening; a second electrode disposed on the variable resistance layer; a first protection layer which covers lateral surfaces of the variable resistance layer; and a second protection layer which covers the first protection layer.

Inventors:
OKAMOTO Koichiro (7-1 Shiba 5-chome, Minato-k, Tokyo 01, 〒1088001, JP)
TADA Munehiro (7-1 Shiba 5-chome, Minato-k, Tokyo 01, 〒1088001, JP)
BANNO Naoki (7-1 Shiba 5-chome, Minato-k, Tokyo 01, 〒1088001, JP)
IGUCHI Noriyuki (7-1 Shiba 5-chome, Minato-k, Tokyo 01, 〒1088001, JP)
Application Number:
JP2019/009605
Publication Date:
September 19, 2019
Filing Date:
March 11, 2019
Export Citation:
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Assignee:
NEC CORPORATION (7-1 Shiba 5-chome, Minato-ku Tokyo, 01, 〒1088001, JP)
International Classes:
H01L21/8239; H01L27/105; H01L45/00; H01L49/00
Domestic Patent References:
WO2014030393A12014-02-27
Foreign References:
JP2012195530A2012-10-11
JP2008021750A2008-01-31
JP2016192510A2016-11-10
Attorney, Agent or Firm:
SHIMOSAKA Naoki (7-1 Shiba 5-chome, Minato-k, Tokyo 01, 〒1088001, JP)
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