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Patent Searching and Data


Title:
SEMICONDUCTOR DEVICE PRODUCTION METHOD, SUBSTRATE PROCESSING DEVICE AND PROGRAM
Document Type and Number:
WIPO Patent Application WO/2019/021465
Kind Code:
A1
Abstract:
Provided is a technique for detecting the state of a substrate even where an anomaly exists with the substrate, without a mechanism for detecting the state of a substrate coming into contact with the substrate. A technique according to an embodiment of the present invention has: a step of conveying into a reaction tube a substrate holding tool whereon is placed a plurality of substrates; a step of supplying a gas into the reaction tube to process the substrates; a step of conveying the substrate holding tool out of the reaction tube after processing the substrates; and a step of detecting the substrates placed on the substrate holding tool while the substrate holding tool is rotated by a prescribed angle relative to the reference position wherein the substrates can be transferred.

Inventors:
MIYADA TOMOYUKI (JP)
ABIKO HAJIME (JP)
KAWASAKI JYUNICHI (JP)
OKAZAKI TADASHI (JP)
Application Number:
JP2017/027474
Publication Date:
January 31, 2019
Filing Date:
July 28, 2017
Export Citation:
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Assignee:
KOKUSAI ELECTRIC CORP (JP)
International Classes:
H01L21/67
Foreign References:
JP2010153906A2010-07-08
JP2012146809A2012-08-02
JPH07130727A1995-05-19
JP2011018908A2011-01-27
JPH10135313A1998-05-22
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