Title:
SEMICONDUCTOR INSPECTION DEVICE AND SEMICONDUCTOR INSPECTION METHOD USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2011/001635
Kind Code:
A1
Abstract:
Provided are a semiconductor inspection device and a semiconductor inspection method such that in a specimen image in a single field of view obtained by an electron microscope, it is possible to suppress variations in the edge position measurement error attributable to the materials and structures of the lower layers of measured patterns by a first method, wherein the area in the field of view obtained by electron beam scanning is divided into a plurality of regions on the basis of information regarding the structures and materials of the object to be observed and the electron beam scanning conditions are changed for individual regions (805, 806), a second method, wherein, the image processing conditions are changed for individual regions resulting from division of the obtained images, or a third method, wherein the edge detection conditions are changed for individual regions resulting from the division within the edge inspection regions of the obtained images.
Inventors:
YAMAGUCHI, Atsuko (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
山口敦子 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
MOMONOI, Yoshinori (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
桃井義典 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
山口敦子 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
MOMONOI, Yoshinori (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
桃井義典 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
Application Number:
JP2010/004183
Publication Date:
January 06, 2011
Filing Date:
June 23, 2010
Export Citation:
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
YAMAGUCHI, Atsuko (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
山口敦子 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
MOMONOI, Yoshinori (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
YAMAGUCHI, Atsuko (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
山口敦子 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地株式会社日立製作所中央研究所内 Tokyo, 〒1858601, JP)
MOMONOI, Yoshinori (HITACHI LTD., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
International Classes:
G01B15/04; G01N23/225; H01L21/66
Attorney, Agent or Firm:
Polaire I.P.C. (7-1Hatchobori 2-chome, Chuo-ku Tokyo, 32, 〒1040032, JP)
Download PDF: