Title:
SEMICONDUCTOR OPTICAL ELEMENT ARRAY AND MANUFACTURING METHOD THEREFORE
Document Type and Number:
WIPO Patent Application WO/2010/023921
Kind Code:
A1
Abstract:
Disclosed is a semiconductor optical element array, which is equipped with a semiconductor substrate comprising a main surface in which a plurality of indentations is formed, a mask pattern, which is formed on top of the main surface of the semiconductor substrate, and which comprises a plurality of apertures directly on top of each of the plurality of indentations, a plurality of fine columnar crystals made from group III nitride semiconductor and grown upward of the mask pattern from the plurality of indentations through the plurality of apertures, an active layer grown on top of each of the plurality of fine columnar crystals, and a semiconductor layer that covers each of the active layers.
Inventors:
KISHINO, Katsumi (Faculty of Science and Technology Sophia University, Sophia School Corporation, 7-1 Kioi-cho, Chiyoda-k, Tokyo 54, 〒1028554, JP)
岸野克巳 (〒54 東京都千代田区紀尾井町7-1 学校法人上智学院 上智大学理工学部機能創造理工学科内 Tokyo, 〒1028554, JP)
KIKUCHI, Akihiko (Faculty of Science and Technology Sophia University, Sophia School Corporation, 7-1 Kioi-cho, Chiyoda-k, Tokyo 54, 〒1028554, JP)
岸野克巳 (〒54 東京都千代田区紀尾井町7-1 学校法人上智学院 上智大学理工学部機能創造理工学科内 Tokyo, 〒1028554, JP)
KIKUCHI, Akihiko (Faculty of Science and Technology Sophia University, Sophia School Corporation, 7-1 Kioi-cho, Chiyoda-k, Tokyo 54, 〒1028554, JP)
Application Number:
JP2009/004173
Publication Date:
March 04, 2010
Filing Date:
August 27, 2009
Export Citation:
Assignee:
SOPHIA SCHOOL CORPORATION (7-1 Kioi-cho, Chiyoda-ku Tokyo, 54, 〒1028554, JP)
学校法人上智学院 (〒54 東京都千代田区紀尾井町7-1 Tokyo, 〒1028554, JP)
KISHINO, Katsumi (Faculty of Science and Technology Sophia University, Sophia School Corporation, 7-1 Kioi-cho, Chiyoda-k, Tokyo 54, 〒1028554, JP)
岸野克巳 (〒54 東京都千代田区紀尾井町7-1 学校法人上智学院 上智大学理工学部機能創造理工学科内 Tokyo, 〒1028554, JP)
学校法人上智学院 (〒54 東京都千代田区紀尾井町7-1 Tokyo, 〒1028554, JP)
KISHINO, Katsumi (Faculty of Science and Technology Sophia University, Sophia School Corporation, 7-1 Kioi-cho, Chiyoda-k, Tokyo 54, 〒1028554, JP)
岸野克巳 (〒54 東京都千代田区紀尾井町7-1 学校法人上智学院 上智大学理工学部機能創造理工学科内 Tokyo, 〒1028554, JP)
International Classes:
H01L33/00; H01L21/205; H01S5/343
Attorney, Agent or Firm:
HAYAMI, Shinji (Gotanda TG Bldg. 9F, 9-2 Nishi-Gotanda 7-chome, Shinaga-k, Tokyo 31, 〒1410031, JP)
Previous Patent: WO/2010/023920
Next Patent: METHOD FOR DEGRADING HEXAMETHYLENE DIISOCYANATE POLYUREA COMPOUNDS
Next Patent: METHOD FOR DEGRADING HEXAMETHYLENE DIISOCYANATE POLYUREA COMPOUNDS
