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Patent Searching and Data


Title:
SEMICONDUCTOR PROCESS APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/111354
Kind Code:
A1
Abstract:
A semiconductor process apparatus. The semiconductor process apparatus comprises a process chamber (1), a gas intake device (2), a base (3) and a flow guide structure (8, 8'), wherein the interior of the process chamber (1) is divided into a process area (11) and a wafer transfer area (12) from top to bottom; the gas intake device (2) is arranged at the top of the process chamber (1) and is used to introduce process gas into the process area (11); the base (3) is arranged in the wafer transfer area (12) in a lifting manner and is used to bear a wafer; the flow guide structure (8, 8') is connected to a gas supply source, is fixed to the base (3), and is used to blow gas to the outer side of the outer peripheral surface of the base (3) when the base (3) is located at a process position, such that a gas wall can be formed between the outer peripheral surface of the base (3) and the inner peripheral surface of the side wall of the process chamber (1), and the process gas in the process area (11) is prevented from entering the wafer transfer area (12); and an exhaust structure (13) is arranged in the side wall of the process chamber (1) and used to exhaust the gas blown out by the flow guide structure (8, 8') when the base (3) is located at the process position. According to the apparatus, the process area (11) is completely isolated from the wafer transfer area (12), such that a blowing time of the process chamber (1) is significantly shortened, and the productivity is thus improved.

Inventors:
REN XIAOYAN (CN)
WANG YONGFEI (CN)
SHI XIAOPING (CN)
ZHENG BO (CN)
LAN YUNFENG (CN)
QIN HAIFENG (CN)
ZHANG WENQIANG (CN)
WANG HAO (CN)
Application Number:
PCT/CN2021/131149
Publication Date:
June 02, 2022
Filing Date:
November 17, 2021
Export Citation:
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Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
C23C16/455; C23C16/44; C23C16/458
Foreign References:
CN112593208A2021-04-02
CN105981135A2016-09-28
JP2012186248A2012-09-27
CN1317147A2001-10-10
CN109811406A2019-05-28
CN111952233A2020-11-17
CN105695936A2016-06-22
Other References:
See also references of EP 4253596A4
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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