Title:
SEMICONDUCTOR PROCESSING FURNACE HEATING CONTROL SYSTEM
Document Type and Number:
WIPO Patent Application WO1998039793
Kind Code:
A3
Abstract:
A vertically oriented thermal processor supporting semiconductor wafers within a vertical processing chamber within a process tube about which a furnace heater is supported utilizes a model-base control target in combination with a heating control system configured to heat portions of the furnace in order to achieve a thermally uniform processing chamber environment. A furnace power controller implements a dynamic control system configured to achieve a desired uniform thermal distribution within the processing chamber during various processing cycles for semiconductor wafers. Preferably, the control system monitors thermal conditions within the chamber and compares the conditions with a desired thermal model of the furnace, and activates/deactivates one or more heater elements within the furnace in order to achieve a desired thermal condition within the processing chamber.
Inventors:
BETHUNE EDWIN M
OLMSTED DONALD
OLMSTED DONALD
Application Number:
PCT/US1998/003310
Publication Date:
December 10, 1998
Filing Date:
February 20, 1998
Export Citation:
Assignee:
SEMITOOL INC (US)
International Classes:
H01L21/00; (IPC1-7): H01L/
Foreign References:
| US5436172A | 1995-07-25 | |||
| US5555725A | 1996-09-17 | |||
| US4570054A | 1986-02-11 | |||
| US5001327A | 1991-03-19 |
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