Title:
SEMICONDUCTOR PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2003/090264
Kind Code:
A1
Abstract:
A semiconductor processing system (2) comprising a flow-rate measuring unit (6) for inspecting flow-rate controllers (38A-38E) that control process-gas flow rates. The flow-rate measuring unit (6) has an inspection container (54) having a specified capacity and being disposed on a gas bypass line (52) for connecting a gas supply line (30) with an exhaust line (22) so as to bypass a processing chamber (8), with a pressure gage (58) disposed to detect pressure in the container (54). A flow-rate computing unit (64) is disposed to determine gas flow rates at flow-rate controllers based on a pressure rise rate detected by the pressure gage (58). System control units (44, 62) control the step of supplying an inert gas into the container (54) to purge it before or after process gas is fed into the container (54).
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Inventors:
NAGAOKA HIDEKI (JP)
MOROKATA AYA (JP)
SASAKI NORIKAZU (JP)
SHIMURA KAZUSHIGE (JP)
MIZUSAWA KENETSU (JP)
OBI AKIRA (JP)
ABE MASAAKI (JP)
MOROKATA AYA (JP)
SASAKI NORIKAZU (JP)
SHIMURA KAZUSHIGE (JP)
MIZUSAWA KENETSU (JP)
OBI AKIRA (JP)
ABE MASAAKI (JP)
Application Number:
PCT/JP2003/004716
Publication Date:
October 30, 2003
Filing Date:
April 14, 2003
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
NAGAOKA HIDEKI (JP)
MOROKATA AYA (JP)
SASAKI NORIKAZU (JP)
SHIMURA KAZUSHIGE (JP)
MIZUSAWA KENETSU (JP)
OBI AKIRA (JP)
ABE MASAAKI (JP)
NAGAOKA HIDEKI (JP)
MOROKATA AYA (JP)
SASAKI NORIKAZU (JP)
SHIMURA KAZUSHIGE (JP)
MIZUSAWA KENETSU (JP)
OBI AKIRA (JP)
ABE MASAAKI (JP)
International Classes:
G01F25/00; H01L21/00; G01F1/00; (IPC1-7): H01L21/02; H01L21/205; G01F1/34
Foreign References:
| JPH0677234U | 1994-10-28 | |||
| JPH11223538A | 1999-08-17 | |||
| JPH07306084A | 1995-11-21 |
Attorney, Agent or Firm:
Suzuye, Takehiko c/o SUZUYE & SUZUYE (7-2 Kasumigaseki 3-chom, Chiyoda-ku Tokyo, JP)
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