Title:
SEMICONDUCTOR PRODUCTION APPARATUS AND PROCESS
Document Type and Number:
WIPO Patent Application WO/2007/043206
Kind Code:
A1
Abstract:
[PROBLEMS] To provide a semiconductor production apparatus capable of modifying
an insulating film. [MEANS FOR SOLVING PROBLEMS] Irradiation unit is provided
with irradiation means for irradiating an insulating film with a light of wavelength
equal to or greater than that corresponding to the absorption edge of the insulating
film, the wavelength not greater than that required for severing a bonding group
associated with hydrogen of the insulating film.
Inventors:
SHIOYA, Yoshimi (1-3-7-905, Minami-yamada Tsuzuki-k, Yokohama-shi Kanagawa 29, 2240029, JP)
Application Number:
JP2006/308544
Publication Date:
April 19, 2007
Filing Date:
April 24, 2006
Export Citation:
Assignee:
YATABE, Massao (3-28-3, Tsurumaki Setagaya-ku Tokyo, 16, 1540016, JP)
矢田部 仁雄 (〒16 東京都世田谷区弦巻３－２８－３ Tokyo, 1540016, JP)
OKUMURA, Masaru (187-11, Koaza-Minami-kohai Ooaza-kizu, Kizucho, Sagara-gu, Kyoto 86, 6190286, JP)
矢田部 仁雄 (〒16 東京都世田谷区弦巻３－２８－３ Tokyo, 1540016, JP)
OKUMURA, Masaru (187-11, Koaza-Minami-kohai Ooaza-kizu, Kizucho, Sagara-gu, Kyoto 86, 6190286, JP)
International Classes:
H01L21/31; H01L21/316
Attorney, Agent or Firm:
SAWADA, Masao (3-13-6-1211, Minami-rokugo Ohta-ku, Tokyo 45, 1440045, JP)
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