Title:
SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREFOR, AND ELECTRONIC DEVICE COMPRISING STORAGE DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/042255
Kind Code:
A1
Abstract:
Disclosed are a semiconductor storage device and a manufacturing method therefor, and an electronic device comprising the storage device. According to the embodiments, the semiconductor storage device may comprise: a substrate; a storage unit array disposed on the substrate, storage units in the storage unit array being arranged in rows and columns, each storage unit comprising a vertically extending columnar active region, and the columnar active region comprising source/drain regions respectively located at the upper and lower ends and a channel region between the source/drain regions; and multiple bit lines formed on the substrate, each bit line being located below a corresponding storage unit column and electrically connected to the source/drain regions at the lower ends of the storage units in the corresponding column, each storage unit further comprising a gate stack formed around the periphery of the channel region, and gate conductor layers in the gate stacks of storage units in a particular storage unit row continuously extend in the direction of the row to form a corresponding word line.
Inventors:
ZHU HUILONG (US)
Application Number:
PCT/CN2018/107038
Publication Date:
March 05, 2020
Filing Date:
September 21, 2018
Export Citation:
Assignee:
INST OF MICROELECTRONICS CAS (CN)
International Classes:
H01L27/108; H01L21/8242
Foreign References:
| CN101090117A | 2007-12-19 | |||
| CN101226960A | 2008-07-23 | |||
| CN102522407A | 2012-06-27 |
Attorney, Agent or Firm:
CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)
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