Title:
SEMICONDUCTOR WAFER TESTING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2010/067491
Kind Code:
A1
Abstract:
Disclosed is a semiconductor wafer testing apparatus that resolves the following problems which arise when semiconductor wafers become larger: (1) complexity of stage acceleration/deceleration control; (2) throughput reduction; and (3) increased vibration of the stage support platform during the stage inversion operation (deterioration in resolution). In the semiconductor wafer testing apparatus for resolving these problems, a wafer is rotated, an electron beam is irradiated onto the rotating wafer from a scanning electron microscope, and secondary electrons emitted from the wafer are detected. The detected secondary electrons are A/D converted by an image processing unit, realigned by an image data realignment unit, and then image-processed for display. As a result, image information of all dies of a wafer can be acquired without a large amount of movement of the stage in the X and the Y directions.
Inventors:
TOBA TADANOBU (JP)
HIRANO KATSUNORI (JP)
SATO NORIO (JP)
OHASHI MASAHIRO (JP)
HIRANO KATSUNORI (JP)
SATO NORIO (JP)
OHASHI MASAHIRO (JP)
Application Number:
PCT/JP2009/004722
Publication Date:
June 17, 2010
Filing Date:
September 18, 2009
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
TOBA TADANOBU (JP)
HIRANO KATSUNORI (JP)
SATO NORIO (JP)
OHASHI MASAHIRO (JP)
TOBA TADANOBU (JP)
HIRANO KATSUNORI (JP)
SATO NORIO (JP)
OHASHI MASAHIRO (JP)
International Classes:
H01L21/66; G01B15/00
Foreign References:
| JP2001056306A | 2001-02-27 | |||
| JP2003166809A | 2003-06-13 | |||
| JP2007158099A | 2007-06-21 | |||
| JPS62110248A | 1987-05-21 |
Attorney, Agent or Firm:
POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)
Polaire Intellectual Property Corporation (JP)
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