Title:
SENSOR SYSTEM AND INCLINATION DETECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2020/059685
Kind Code:
A1
Abstract:
The present invention identifies information about an inclination of a wafer, the information being more specific than the presence of the inclination. This sensor system (1) is provided with a PLC (2) that identifies the direction of the inclination of a wafer (10) being detected and the degree of the inclination of the wafer (10) on the basis of the change in light amount during a period in which a photoelectric sensor (6) detects the wafer (10).
Inventors:
UENO SHINJI (JP)
Application Number:
PCT/JP2019/036310
Publication Date:
March 26, 2020
Filing Date:
September 17, 2019
Export Citation:
Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
International Classes:
H01L21/67; B25J13/08; B25J15/00; G01C9/00; H01L21/677; H01L21/68
Foreign References:
| JP2012523682A | 2012-10-04 | |||
| JP2014143388A | 2014-08-07 | |||
| JP2001093963A | 2001-04-06 | |||
| JPH0685042A | 1994-03-25 | |||
| JP2002076097A | 2002-03-15 |
Attorney, Agent or Firm:
MURAKAMI, Takashi (JP)
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