Title:
SEPARATION MEMBRANE CLEANING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2007/029291
Kind Code:
A1
Abstract:
A separation membrane cleaning composition comprising at least an acid, a compound capable of forming a complex with a metal, and an oxidant. The acid is preferably one containing hydrochloric acid. The compound capable of forming a complex with a metal is preferably one containing glycine. The oxidant is preferably one containing hydrogen peroxide. By the use of this composition, any microbe-generated slime, etc. adhering to the surface and pore interior of separation membrane can be decomposed and removed, and any adhering metal salts can be removed as a metal chelate compound.
Inventors:
YAMAGUCHI TOSHIO (JP)
YAMAHARA TOSHIYUKI (JP)
YAMAHARA TOSHIYUKI (JP)
Application Number:
PCT/JP2005/016046
Publication Date:
March 15, 2007
Filing Date:
September 01, 2005
Export Citation:
Assignee:
NOVEL TECHNOLOGY CO LTD (JP)
YAMAGUCHI TOSHIO (JP)
YAMAHARA TOSHIYUKI (JP)
YAMAGUCHI TOSHIO (JP)
YAMAHARA TOSHIYUKI (JP)
International Classes:
B01D65/06; C11D7/08; C11D7/32
Foreign References:
| JP2004344851A | 2004-12-09 | |||
| JPS60805A | 1985-01-05 | |||
| JPS63147504A | 1988-06-20 |
Attorney, Agent or Firm:
HAYAKAWA, Yuzi et al. (Suite 501 Hikawa-Annex No.2, 9-5, Akasaka 6-chom, Minato-ku Tokyo 52, JP)
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