Title:
SETTER FOR HEAT TREATMENT OF GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2008/007621
Kind Code:
A1
Abstract:
Disclosed is a setter for a heat treatment of a glass substrate, which is hardly deformed even when repeatedly used within a temperature range of a heat treatment for a glass substrate. Specifically disclosed is a setter for a heat treatment of a glass substrate, which is composed of a ceramic sintered body. This setter for a heat treatment of a glass substrate is characterized in that the ceramic sintered body has a water absorption of 0-0.14% by mass after a heat treatment at 600˚C. Also specifically disclosed is a method for producing a setter for a heat treatment of a glass substrate, wherein a primitive plate is formed by sintering a raw material powder. This method for producing a setter for a heat treatment of a glass substrate is characterized in that the raw material powder contains a crystalline powder and/or a crystallized glass powder and a frit powder, and the difference of average thermal expansion coefficient at 30-600˚C between the crystalline powder or crystallized glass powder and the frit powder is not more than 40 x 10-7 /K.
Inventors:
HASHIBE YOSHIO (JP)
Application Number:
PCT/JP2007/063581
Publication Date:
January 17, 2008
Filing Date:
July 06, 2007
Export Citation:
Assignee:
NIPPON ELECTRIC GLASS CO (JP)
HASHIBE YOSHIO (JP)
HASHIBE YOSHIO (JP)
International Classes:
C04B35/19; C03B32/00; F27D3/12; H01J9/02; H01J9/46; H01J11/20; H01J11/44
Foreign References:
| JPH11322409A | 1999-11-24 | |||
| JP2005180743A | 2005-07-07 | |||
| JPH0611666B2 | 1994-02-16 |
Attorney, Agent or Firm:
NAITO, Teruo et al. (7-13 Nishi-Shimbashi 1-chom, Minato-ku Tokyo 03, JP)
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