Title:
SHAPE CORRECTION DEVICE AND SHAPE CORRECTION METHOD FOR GRAPHICAL PATTERN
Document Type and Number:
WIPO Patent Application WO/2019/012887
Kind Code:
A1
Abstract:
Lithography based on a unit figure (10) simulates the formation of a real pattern on a real substrate. First, the unit figure (10) is divided into polygons (Fig. (a)) to define vectors (Va1 through Vd4) on individual sides of the polygons (Fig. (b)). Vectors sharing the same interval are eliminated to thereby leave vectors (V1 through V10) along the outline of the unit figure (10) (Fig. (c)). Normal end points (A through J) are defined as the start points of each vector (V1 through V10) and a contour line segment (line segment AB, etc.) is defined with mutually adjacent normal end points as both ends of the contour line segment (Fig. (d)). The midpoint of each contour line segment is defined as an evaluation point to calculate the displacement of each evaluation point via simulation. The position of middle normal end points (B, C, D, G, H, I) that are not vertexes is additionally defined as a supplementary end point to secure different end points for each right and left contour line segment. The correction is performed by shifting each contour line segment in a direction perpendicular to the outline in accordance with the displacement.
Inventors:
OOKAWA YOUHEI (JP)
SHIMOMURA TAKEYA (JP)
SHIMOMURA TAKEYA (JP)
Application Number:
PCT/JP2018/022296
Publication Date:
January 17, 2019
Filing Date:
June 12, 2018
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
G03F1/36; G03F7/20; G06F17/50; H01L21/027
Domestic Patent References:
| WO2016102607A1 | 2016-06-30 | |||
| WO2003067331A1 | 2003-08-14 |
Foreign References:
| JP2016134567A | 2016-07-25 | |||
| JP2008065246A | 2008-03-21 | |||
| JPH11194480A | 1999-07-21 |
Attorney, Agent or Firm:
SHIMURA Hiroshi (JP)
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