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Patent Searching and Data


Title:
SHEET FOR MASK
Document Type and Number:
WIPO Patent Application WO/2011/142377
Kind Code:
A1
Abstract:
Disclosed is a sheet for a mask, which has an excellent preventive activity on the attachment of pollen dust. Specifically disclosed are: a sheet for a mask, which comprises a base material that is coated with a coating agent comprising a silicon compound and a cationic antistatic agent; and a mask produced using the sheet. The sheet for a mask and the mask have an excellent preventive activity on the attachment of pollen dust.

Inventors:
MATSUO KAZUHIKO (JP)
YOKOTA MITSURU (JP)
SUGAYA SUEO (JP)
Application Number:
PCT/JP2011/060826
Publication Date:
November 17, 2011
Filing Date:
May 11, 2011
Export Citation:
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Assignee:
KOWA CO (JP)
DAIWA CHEMICAL IND CO LTD (JP)
MATSUO KAZUHIKO (JP)
YOKOTA MITSURU (JP)
SUGAYA SUEO (JP)
International Classes:
A62B18/02; D06M11/79; D06M13/328; D06M13/463; D06M15/643; D06M17/00
Domestic Patent References:
WO2006038493A12006-04-13
Foreign References:
JPH10225526A1998-08-25
JP2007197850A2007-08-09
JPH0385181A1991-04-10
JP2009118960A2009-06-04
JPH03129053A1991-06-03
Attorney, Agent or Firm:
OGURI Shohei et al. (JP)
Shohei Oguri (JP)
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Claims: